Influences of the temperature on the electrical properties of HfO2-based resistive switching devices

Producción Científica

Detalles Bibliográficos
Autores: García García, Héctor, Boo Alvarez, Jonathan, Vinuesa Sanz, Guillermo, González Ossorio, Óscar, Sahelices Fernández, Benjamín, Dueñas Carazo, Salvador, Castán Lanaspa, María Helena, Bargalló González, Mireia, Campabadal Segura, Francesca
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2021
País:España
Institución:Universidad de Valladolid
Repositorio:UVaDOC. Repositorio Documental de la Universidad de Valladolid
OAI Identifier:oai:uvadoc.uva.es:10324/59092
Acceso en línea:https://doi.org/10.3390/electronics10222816
https://uvadoc.uva.es/handle/10324/59092
Access Level:acceso abierto
Palabra clave:Electric resistors
Switching circuits
Electronic Circuits and Devices
Resistive switching
ReRAM devices
Neuromorphic computing
Conduction mechanisms
2202.03 Electricidad
id ES_352c7f0e2d40c6fb4ec3a00b00d55b79
oai_identifier_str oai:uvadoc.uva.es:10324/59092
network_acronym_str ES
network_name_str España
repository_id_str
spelling Influences of the temperature on the electrical properties of HfO2-based resistive switching devicesGarcía García, HéctorBoo Alvarez, JonathanVinuesa Sanz, GuillermoGonzález Ossorio, ÓscarSahelices Fernández, BenjamínDueñas Carazo, SalvadorCastán Lanaspa, María HelenaBargalló González, MireiaCampabadal Segura, FrancescaElectric resistorsSwitching circuitsElectronic Circuits and DevicesResistive switchingReRAM devicesNeuromorphic computingConduction mechanisms2202.03 ElectricidadProducción CientíficaIn the attempt to understand the behavior of HfO2-based resistive switching devices at low temperatures, TiN/Ti/HfO2/W metal–insulator–metal devices were fabricated; the atomic layer deposition technique was used to grow the high-k layer. After performing an electroforming process at room temperature, the device was cooled in a cryostat to carry out 100 current–voltage cycles at several temperatures ranging from the “liquid nitrogen temperature” to 350 K. The measurements showed a semiconducting behavior in high and low resistance states. In the low resistance state, a hopping conduction mechanism was obtained. The set and reset voltages increased when temperature decreased because the thermal energies for oxygen vacancies and ions were reduced. However, the temperature did not influence the power absorbed in the reset transition, indicating the local temperature in the filament controls the transition. The set transition turned from gradual to abrupt when decreasing the temperature, due to a positive feedback between the current increase and the Joule heating at low temperatures.Ministerio de Economía, Industria y Competitividad - Fondo Europeo de Desarrollo Regional (Projects TEC2017-84321-C4-2-R and TEC2017-84321-C4-1-R)MDPI2021info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://doi.org/10.3390/electronics10222816https://uvadoc.uva.es/handle/10324/59092reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolidinstname:Universidad de ValladolidIngléshttps://www.mdpi.com/2079-9292/10/22/2816info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by/4.0/oai:uvadoc.uva.es:10324/590922026-06-13T12:44:47Z
dc.title.none.fl_str_mv Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
title Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
spellingShingle Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
García García, Héctor
Electric resistors
Switching circuits
Electronic Circuits and Devices
Resistive switching
ReRAM devices
Neuromorphic computing
Conduction mechanisms
2202.03 Electricidad
title_short Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
title_full Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
title_fullStr Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
title_full_unstemmed Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
title_sort Influences of the temperature on the electrical properties of HfO2-based resistive switching devices
dc.creator.none.fl_str_mv García García, Héctor
Boo Alvarez, Jonathan
Vinuesa Sanz, Guillermo
González Ossorio, Óscar
Sahelices Fernández, Benjamín
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Bargalló González, Mireia
Campabadal Segura, Francesca
author García García, Héctor
author_facet García García, Héctor
Boo Alvarez, Jonathan
Vinuesa Sanz, Guillermo
González Ossorio, Óscar
Sahelices Fernández, Benjamín
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Bargalló González, Mireia
Campabadal Segura, Francesca
author_role author
author2 Boo Alvarez, Jonathan
Vinuesa Sanz, Guillermo
González Ossorio, Óscar
Sahelices Fernández, Benjamín
Dueñas Carazo, Salvador
Castán Lanaspa, María Helena
Bargalló González, Mireia
Campabadal Segura, Francesca
author2_role author
author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Electric resistors
Switching circuits
Electronic Circuits and Devices
Resistive switching
ReRAM devices
Neuromorphic computing
Conduction mechanisms
2202.03 Electricidad
topic Electric resistors
Switching circuits
Electronic Circuits and Devices
Resistive switching
ReRAM devices
Neuromorphic computing
Conduction mechanisms
2202.03 Electricidad
description Producción Científica
publishDate 2021
dc.date.none.fl_str_mv 2021
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://doi.org/10.3390/electronics10222816
https://uvadoc.uva.es/handle/10324/59092
url https://doi.org/10.3390/electronics10222816
https://uvadoc.uva.es/handle/10324/59092
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv https://www.mdpi.com/2079-9292/10/22/2816
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by/4.0/
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by/4.0/
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv MDPI
publisher.none.fl_str_mv MDPI
dc.source.none.fl_str_mv reponame:UVaDOC. Repositorio Documental de la Universidad de Valladolid
instname:Universidad de Valladolid
instname_str Universidad de Valladolid
reponame_str UVaDOC. Repositorio Documental de la Universidad de Valladolid
collection UVaDOC. Repositorio Documental de la Universidad de Valladolid
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869405864634351616
score 15,228081