Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes

The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated...

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Detalhes bibliográficos
Autores: Martínez Cuadrado, Nicolás Francisco, Patil, Shivprasad, Lozano, José R., García García, Ricardo
Formato: artículo
Fecha de publicación:2006
País:España
Recursos:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/17931
Acesso em linha:http://hdl.handle.net/10261/17931
Access Level:acceso abierto
Palavra-chave:Atomic force microscopy
Silicon
Elemental semiconductors
Vibrational modes
Surface topography
Descrição
Resumo:The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated molecular materials with a phase shift sensitivity that is about one order of magnitude higher than the one achieved in amplitude modulation atomic force microscopy.