Szkudlarek, A., Michalik, J. M., Serrano-Esparza, I., Novácek, Z., Novotná, V., Ozga, P., . . . De Teresa, J. M. (2024). Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO<sub>2</sub> substrates.
Citação norma ChicagoSzkudlarek, Aleksandra, Jan M. Michalik, Inés Serrano-Esparza, Zdenek Novácek, Veronika Novotná, Piotr Ozga, Czeslaw Kapusta, e José María De Teresa. Graphene Removal By Water-assisted Focused Electron-beam-induced Etching – Unveiling the Dose and Dwell Time Impact On the Etch Profile and Topographical Changes in SiO<sub>2</sub> Substrates. 2024.
Citação norma MLASzkudlarek, Aleksandra, et al. Graphene Removal By Water-assisted Focused Electron-beam-induced Etching – Unveiling the Dose and Dwell Time Impact On the Etch Profile and Topographical Changes in SiO<sub>2</sub> Substrates. 2024.